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原子層沉積系統（ALD）
ALD-02原子層沉積系統 ALD
價 格：詢價
產 地：美國更新時間：2020-09-23 14:56
品 牌：SVT Associates型 號：ALD-02
狀 態：正常點擊量：2004
400-006-7520
聯系我時，請說明是在上海非利加實業有限公司上看到的，謝謝！
聯 系 人：
上海非利加實業有限公司
電 話：
400-006-7520
傳 真：
400-006-7520
配送方式：
上海自提或三方快遞
聯系我時請說在上海非利加實業有限公司上看到的,謝謝！
The Advanced ALD system is a viscous flow-type reactor for ultra thin film deposition. The growth process is controlled by a Windows-based software package. The base model is equipped with two gas lines and handles wafer size up to 12 ". With a compact footprint, all hardware is enclosed in a negative pressure cabinet for safety more information.
產品參數
Operation Vacuum: 1 Torr to UHV
2 Heated Gas Lines (can be expanded to 12)
Gas injection mode: bubbler and direct draw
Sample size: up to 4 in standard, optional 12in
Substrate heater: up to 500°C, optional higher temp
產品介紹
Applications
High k dielectrics
Nanocoatings
Surface modification layers
Device encapsulations
Photonic crystals
Optional add-on components
Remote plasma source
Ozone delivery system
Quartz crystal monitor
Quadruple mass spectrometer
Real-time temperature monitor
Ellipsometer
LoadLock
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